気相分解／全反射蛍光Ｘ線分析法によるシリコンウェハー上の軽元素分析

DOI NDLデジタルコレクション Web Site Web Site 被引用文献4件 参考文献23件 オープンアクセス
  • 山上 基行
    X-ray Research Laboratory, Rigaku Corporation
  • 野々口 雅弘
    X-ray Research Laboratory, Rigaku Corporation
  • 山田 隆
    X-ray Research Laboratory, Rigaku Corporation
  • 庄司 孝
    X-ray Research Laboratory, Rigaku Corporation
  • 宇高 忠
    X-ray Research Laboratory, Rigaku Corporation
  • 森 良弘
    Advanced Technology Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
  • 野村 惠章
    Junior College of Electronics Information, Osaka Electro-Communication University
  • 谷口 一雄
    Department of Materials Science, Faculty of Engineering, Osaka Electro-Communication University
  • 脇田 久伸
    Department of Chemistry, Faculty of Science, Fukuoka University
  • 池田 重良
    SR Center, Ritsumeikan University

書誌事項

タイトル別名
  • Analysis of light elements on Si wafer by vapor-phase decomposition/total reflection X-ray fluorescence.
  • キソウ ブンカイ ゼン ハンシャ ケイコウ Xセン ブンセキホウ ニ ヨル シリコンウェハー ジョウ ノ ケイゲンソ ブンセキ

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説明

A combination of vapor-phase decomposition (VPD) and total reflection X-ray fluorescence (TXRF), VPD/TXRF, was used for measuring trace elements of Na and Al. A TXRF measurement using W-Mα line was carried out for a highly sensitivity analysis of ultra trace light elements. The technique of VPD/TXRF combining W-Mα excitation could clearly detect the peaks for a sample at a level of 1011 atoms cm-2 that conventional TXRF could not have detected. In the case of 150 mm Si wafers, the lower limits of detection (LLDs) were found to be 3 × 1010 atoms cm-2 and 2 × 109 atoms cm-2 for Na and Al, respectively. The LLDs were improved by two orders of magnitude compared with those of TXRF without using the VPD treatment. The results obtained by VPD/TXRF were cross-checked with the one obtained by AAS. Both values were in good agreement. The glancing-angle dependence of the TXRF intensity was investigated on the samples before and after undergoing the VPD treatment. This dependence proves that the sample after a VPD treatment is the particle type on the wafer.

収録刊行物

  • 分析化学

    分析化学 48 (11), 1005-1011, 1999

    公益社団法人 日本分析化学会

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