書誌事項
- タイトル別名
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- Studies of the Distribution of the Self-Bias Potential on an RF Electrode in Plasma.
- コウシュウハ ホウデン デンキヨクジョウ ノ ジコ バイアス デンイ ブンプ
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説明
Self-bias potential and its distribution of a radio-frequency (RF) electrode have been measured in argon and helium plasma using probes penetrating the electrode. In the absence of the magnetic field the self-bias potential distribution is almost homogeneous at-150 V (RF power = 26 W) in Ar plasma. When the magnetic field (B =0.04 T) parallel to the electrode is applied, the mean value of the potential is reduced to-40 V and the gradient in the potential distribution occurs along the E× B direction. Rotation of the magnetic field at a frequency below 50 Hz is unable to reduce potential inhomogeneity, but this technique enables us to measure the potential distribution as a continuous function of the azimuthal angle. In helium plasma, another type of inhomogeneity parallel to the magnetic field occurs; this inhomogeneity can be reduced effectively by pulsed Ar gas injection. These data are discussed to show physical meaning and industrial applications.
収録刊行物
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- 真空
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真空 37 (8), 621-628, 1994
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679039995392
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- NII論文ID
- 10007964268
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 3888944
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
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