The Mass Production Technology of Pb (Zr, Ti)O3 Piezoelectric Thin Film by Radio Frequency Magnetron Sputtering
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- KIMURA Isao
- Institute for Semiconductor Technologies, ULVAC, Inc.
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- NISHIOKA Yutaka
- Institute for Semiconductor Technologies, ULVAC, Inc.
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- KIKUCHI Shin
- Institute for Semiconductor Technologies, ULVAC, Inc.
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- SUU Koukou
- Institute for Semiconductor Technologies, ULVAC, Inc.
Bibliographic Information
- Other Title
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- 高周波マグネトロンスパッタリング法によるPb(Zr,Ti)O3圧電薄膜の量産技術
- コウシュウハ マグネトロン スパッタリングホウ ニ ヨル Pb Zr Ti O3 アツデン ハクマク ノ リョウサン ギジュツ
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Abstract
In this study, SME-200 (ULVAC and Inc.) was the mass production system of a PZT deposition got over the problems, and it was there, and deposition temperature of PZT thin films were investigated as a parameter by this research. (100)/(001) and (111) oriented Pb(Zr, Ti)O3 Piezoelectric thin films were fabricated on (111)Pt/Ti/SiO2/Si substrate using a RF magnetron sputtering technique. Polarization and displacement in these films were simultaneously observed through an atomic force microscope (AFM) that was attached to a ferroelectric test system. As a result, 3-μm-thick PZT film with Pr value of 41 μm/cm2 at an applied voltage of 30 V were obtained for (100)/(001) oriented film.<br>
Journal
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- Shinku
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Shinku 49 (3), 174-176, 2006
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282679040311296
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- NII Article ID
- 10018133593
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 7931165
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed