書誌事項
- タイトル別名
-
- Deposition of ZnO Thin Films on LiNbO3 Substrates Using Sputtering Technique.
- LiNbO3 キバン ジョウ エ ノ ZnO スパッタ ハクマク ノ ケイセイ
この論文をさがす
抄録
ZnO thin films were deposited on several LiNbO3 substrates with specified orientation by a rf-sputtering technique. The films were deposited on the substrates at room temperature or 573 K in various oxygen-argon atmospheres. From X-ray diffraction pattern, ZnO (002) reflection peak was measured for both of x and z cut LiNbO3 substrates. ZnO (002) peak intensity depended on gas flow rate of oxygen to argon and anneal temperature. When the film was deposited on z cut LiNbO3 substrate at 573 K in O2 (20%) + Ar (80%) gas and annealed at 773 K in air, the film showed the crystalline growth highly oriented at [002] direction.
収録刊行物
-
- 真空
-
真空 42 (3), 163-166, 1999
一般社団法人 日本真空学会
- Tweet
詳細情報 詳細情報について
-
- CRID
- 1390282679040379392
-
- NII論文ID
- 10002476206
-
- NII書誌ID
- AN00119871
-
- ISSN
- 18809413
- 05598516
-
- NDL書誌ID
- 4714221
-
- 本文言語コード
- ja
-
- データソース種別
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- 抄録ライセンスフラグ
- 使用不可