Deposition of BaTiO3 Thin Films by ArF Excimer Laser Ablation.

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  • Deposition of BaTiO3 Thin Films by ArF

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BaTiO3 films have been deposited on a quartz substrate at various substrate temperatures by the ArF excimer laser ablation technique. Crystallization of the film deposited at substrate temperatures as low as 300°C was confirmed by X-ray diffraction analysis. The expansion velocities of the laser plume and the ablated species in the plume have also been investigated by time-resolved optical observation and spectroscopy.

収録刊行物

  • 真空

    真空 36 (4), 410-413, 1993

    一般社団法人 日本真空学会

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