Micro Variable Infrared Filter using Magnetron Sputtering System Enhanced with an Inductively Coupled RF Plasma for CO2 Measurement.

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  • HARA Hitoshi
    Micromachining Laboratory, Yokogawa Electric Corporation
  • KISHI Naoki
    Micromachining Laboratory, Yokogawa Electric Corporation

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Other Title
  • 誘導結合高周波プラズマ支援マグネトロンスパッタによる光学多層膜フィルタの作製と二酸化炭素濃度検出への応用
  • ユウドウ ケツゴウ コウシュウハ プラズマ シエン マグネトロンスパッタ ニ ヨル コウガク タソウ マク フィルタ ノ サクセイ ト 2サンカタンソ ノウド ケンシュツ エ ノ オウヨウ

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Abstract

We have developed a micro variable infrared filter using a magnetron sputtering system enhanced with inductively coupled RF plasma, and have demonstrated CO2 concentration measurement using silicon micro bolometers and the filter as a Non-Dispersive Infra-Red (NDIR) system. The micro variable infrared filter was tuned to two different wavelengths, on and off the CO2 absorption band at 4.3 μm. By combining the NDIR sysytem with a conventional infrared source, concentration of CO2 could be measured in a range of 1000-5000 ppm, with a reproducibility of ± 3.6% (3σ) of the measured values.

Journal

  • Shinku

    Shinku 44 (4), 440-444, 2001

    The Vacuum Society of Japan

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