書誌事項
- タイトル別名
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- Deposition Equipment for X-ray Reflective Films and Characterization of the Films.
- Xセン ハンシャ マク ケイセイ ソウチ ト ハンシャ マク トクセイ
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抄録
To fabricate highly reflective X-ray mirrors coated with metal films, we have developed a deposition system equipped with an electron cyclotron resonance (ECR) ion source to irradiate a substrate with low-energy ions as well as to sputter the metal target. The ECR ion source has been designed to avoid depositing a metal film onto a microwave-introducing window. This design has enabled us to stably deposit metal films, suggesting wide-area X-ray mirrors. A platinum film with a surface roughness of 0.3 nm has been deposited by means of this equipment, which should ensure high-reflectivity X-ray mirrors.
収録刊行物
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- 真空
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真空 36 (1), 32-39, 1993
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679042094464
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- NII論文ID
- 10007955448
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 3812410
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可