Growth of ZnO Thin Films by Planar Magnetron Sputtering and by Chemical Vapor Deposition for Application to Optical Waveguides

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  • SHIOSAKI Tadashi
    Department of Electronics, Faculty of Engineering, Kyoto University
  • SHIMIZU Masaru
    Department of Electronics, Faculty of Engineering, Kyoto University
  • OHNISHI Shinzo
    Department of Electrical Engineering, Polytechnic Institute of New York
  • KAWABATA Akira
    Department of Electronics, Faculty of Engineering, Kyoto University

Bibliographic Information

Other Title
  • プレーナマグネトロンスパッタ法およびＣＶＤ法によるＺｎＯ薄膜の作製と光導波路への応用
  • プレーナマグネトロン スパッタホウ オヨビ CVDホウ ニヨル ZnO ハクマ

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Abstract

ZnO films with an excellent c-axis orientation, transparancy, and surface flatness have been prepared by high deposition-rate rf planar magnetron sputtering. The optical waveguide loss for the TE0 mode of He-Ne 6328 Å line is as low as 2.0 dB/cm in a 4.2 μm thick film without postsputtering treatment. Single-crystalline ZnO films have been grown epitaxial onto sapphire substrates in a ZnO-H2-H2O-O2 system. In this growth, water vapor and intermediately-sputter-deposited very-thin ZnO epitaxial layer are very important to grow ZnO films with an optically flat surface. The optical waveguide loss for the TE0 mode (6328 Å) is as low as 0.7 dB/cm in a 2.57 μm thick film without postgrowth treatment.

Journal

  • Shinku

    Shinku 24 (2), 49-59, 1981

    The Vacuum Society of Japan

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