書誌事項
- タイトル別名
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- Measurement of Au Sputtering Yields by Neon with Low-Energy Mass Analyzed Ion Beam System
- テイエネルギー シツリョウ ブンリ イオン ビーム ショウシャ ソウチ オ モチイタ ネオン ニ ヨル キン ノ スパッタリツ ノ ソクテイ
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The Au sputtering yields by Ne ions were measured in the range of low injection energy with a low-energy mass analyzed ion beam system. For the ion beam characterization, the mass and energy spectra of the Ne ion beams were measured with a plasma process monitor (Balzers, PPM421) and it was found the Ne beams were essentially monochromatic. The ion beam was injected into an Au thin film prepared on a quartz crystal microbalance (QCM) and its sputtering yield was evaluated from the Au mass decrement. It has been found that the measured Au sputtering yields by Ne ion beams in the energy range of 100-200 eV approximately agree with the previously reported corresponding values. The sputtering yields were also measured for the injection energies below 100 eV. The threshold energy for Au sputtering by Ne estimated from the low energy data is 35 eV.<br>
収録刊行物
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- 真空
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真空 50 (3), 217-219, 2007
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282679044073600
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- NII論文ID
- 10019928259
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- NII書誌ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 8786704
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可