Pulse current plating of aluminum from a molten AlCl3-NaCl-KCl bath and computer simulation of the aluminum deposition.

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  • パルス電解によるＡｌＣｌ３‐ＮａＣｌ‐ＫＣｌ系溶融塩浴からのアルミニウムの電析とそのコンピュータシミュレーション

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The performance of Al/FeS2 molten salt secondary cells has been studied. When the cell was charging, dendritic deposits were cathodically produced on the Al electrode, and this was found to lower cell performance.<br>Pulse electrolysis was studied in order to obtain an adherent Al deposit, and computer simulation was carried out to obtain information on the Al deposition.<br>Both experimental and calculated results showed that the morphology of the Al deposit depends mainly on diffusion layer conditions. The simulated deposition agreed with actual morphology for the dendritic deposit.

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Details 詳細情報について

  • CRID
    1390282679089032448
  • NII Article ID
    130003810074
  • DOI
    10.4139/sfj1950.38.471
  • ISSN
    18843395
    00260614
  • Text Lang
    ja
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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