書誌事項
- タイトル別名
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- Application of Electrochemical Quartz Crystal Microbalance to an Electroplating Monitor.
- EQCM ノ メッキ モニター エ ノ オウヨウ
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説明
The frequency change in EQCM was measured in an application to the monitoring of the thickness of nickel electroplating. The monitored thickness depended on the type of plating bath and the plating current density, which affected the stress in the plated film and the adhesive force between the gold film electrode and quartz. Mass sensitivity (Sm) in a simplified Sauerbrey equation, Δf=Sm·Δm, changed with the plating current density and the amount of plated metal. This result is related to the radial mass sensitivity of the EQCM electrode because plated nickel film was concave. Sm must therefore be determined experimentally.
収録刊行物
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- 表面技術
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表面技術 46 (1), 37-41, 1995
一般社団法人 表面技術協会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390282679090834304
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- NII論文ID
- 10001746011
- 10012802429
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 3601985
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
- OpenAIRE
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- 抄録ライセンスフラグ
- 使用不可
