書誌事項
- タイトル別名
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- Effect of Complexing Agents on Electroless NiB Plating.
- ムデンカイ NiB メッキ ニ オケル サクカザイ ノ エイキョウ
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抄録
The effect of four complexing agents-sodium citrate, sodium malonate, glycine and diethylenetriamine-on electroless NiB plating using dimethylamine-borane (DMAB) as a reducing agent was studied. The deposition rate was influenced by the pH, DMAB concentration, and the complexing agent species. The B and C content of deposited films, in particular, was strongly influenced by the complexing agent species. The B content of film deposited from a sodium citrate bath in a pH of 6.5 and 003mol dm-3 DMAB concentration was the highest -5.41wt%-, while the C content was lower -01wt%-. The C content of film deposited from a diethylenetriamine bath at a pH 7.5 and the same DMAB concentration as given above was, in contrast, the highest -0.29wt%-, and the B content was lower -1.34wt%-. XRD results indicated that, in our study, as-deposited films showed an amorphous structure when the condition was such that the boron content was more than 2.5wt%. Such as-deposited films were crystallized by heat treatment at 300°C for 1hr. The lattice distance of Ni (111) was shifted from 0.2017nm to 0.2032nm, and the content of C was found to have increased.
収録刊行物
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- 表面技術
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表面技術 48 (11), 1099-1104, 1997
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390282679092591616
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- NII論文ID
- 10002260227
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- NII書誌ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 4334600
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- 抄録ライセンスフラグ
- 使用不可