Effect of Heat Treatment on the Hardness of Ti-Mo-N Films Deposited by RF Reactive Magnetron Sputtering
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- Komiyama Shoko
- Department of Materials Science, Tohoku University
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- Sutou Yuji
- Department of Materials Science, Tohoku University
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- Koike Junichi
- Department of Materials Science, Tohoku University
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The effects of heat treatment on the microstructure and hardness of Ti-Mo-N films were investigated for various N contents. Ti-Mo-N films were deposited onto a AISI304 stainless steel substrate by reactive RF magnetron sputtering in a mixture of argon (7.5 ccm) and nitrogen (0–2.0 ccm) gases using a Ti50Mo50 target. X-ray analysis of the as-deposited films indicated that the main phases of the Ti-Mo-N film produced at nitrogen gas flow rates of (fN<SUB>2</SUB>)≤0.2 ccm and >0.3 ccm were bcc-(Ti,Mo) and δ-(Ti,Mo)N phase, respectively. As-deposited films were heat treated in an argon atmosphere at 300–1100°C for 30 min. Hardness was measured using a nanoindentation system. There was almost no change in the hardness of the Ti-Mo-N films deposited at fN<SUB>2</SUB>=2.0 ccm after heat treatment. In contrast, the hardness of the films deposited at fN<SUB>2</SUB>=0.2 and 0.3 ccm was significantly increased by heat treatment at temperatures higher than 900°C. In particular, the film deposited at fN<SUB>2</SUB>=0.3 ccm showed a maximum hardness of approximately 35 GPa by heat treatment at 1000°C for 30 min. X-ray measurements and transmission electron microscopy (TEM) observations indicated that the increment of hardness in the Ti-Mo-N film deposited at fN<SUB>2</SUB>=0.3 ccm was due to the formation of a bcc-(Ti,Mo) phase in a δ-(Ti,Mo)N phase.
収録刊行物
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- MATERIALS TRANSACTIONS
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MATERIALS TRANSACTIONS 51 (8), 1467-1473, 2010
公益社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390282679227292672
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- NII論文ID
- 10026513757
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- NII書誌ID
- AA1151294X
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- ISSN
- 13475320
- 13459678
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- NDL書誌ID
- 10768997
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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