Recent Development in Photosensitive Polyimide (PSPI)

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Photosensitive polyimides (PSPIs) are attracting much attention as an insulating materials for microelectronic applications. PSPIs can be directly patterned, simplify processing steps and do not need a photoresist to be used in the micro-lithographic stage, nor a toxic etchant. This review introduces the recent development of PSPIs with emphasis placed on the chemistry responsible for images.

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