Simulation of the Time Evolution Profiles in Nanoimprint Lithography
-
- Tanabe Toshiaki
- Department of Physics and Electronics Engineering, Osaka Prefecture University
-
- Nishihata Masaaki
- Department of Physics and Electronics Engineering, Osaka Prefecture University
-
- Kawata Hiroyuki
- Department of Physics and Electronics Engineering, Osaka Prefecture University
-
- Hirai Yoshihiko
- Department of Physics and Electronics Engineering, Osaka Prefecture University
Search this article
Abstract
To study the time dependence of the resist profiles in nanoimprint lithography, numerical simulation has been done by using conventional finite element method, where the resist is assumed as a viscous fluid body over the glass transition temperature. On the other hand, the resist shape is quenched by rapid cooling just after pressing the resist. Time dependent resist profiles are experimentally observed for various pressing times. The resist filling rate into the mold cavity is evaluated and they relatively agree with each other qualitatively. Also, the dependence of the time evolutions on the aspect ratio of the mold groove is simulated and there exist minimum aspect ratio to shorten the process time.
Journal
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 20 (4), 573-576, 2007
The Society of Photopolymer Science and Technology(SPST)
- Tweet
Details 詳細情報について
-
- CRID
- 1390282679300538880
-
- NII Article ID
- 130004464588
- 40015602532
-
- NII Book ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BD2sXot1Wmsb8%3D
-
- ISSN
- 13496336
- 09149244
-
- NDL BIB ID
- 8919393
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
-
- Abstract License Flag
- Disallowed