EUV Mechanistic Studies of Antimony Resists
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- Murphy Michael
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Narasimhan Amrit
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Grzeskowiak Steven
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Sitterly Jacob
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Schuler Philip
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Richards Jeff
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Denbeaux Greg
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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- Brainard Robert L.
- College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
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Abstract
We have developed a method to study the photomechanism of our antimony carboxylate platform Ph3Sb(O2CR')2. A series of mechanistic studies followed the production of reaction byproducts by mass spectrometer, as they leave the film during exposure to EUV photons or 80 eV electrons. The major volatile products are CO2, benzene and phenol. The rate of outgassing is well-correlated with the reaction energy of decarboxylation of the carboxylate ligand as determined by density functional theory. Additionally, a deuterium labeling study was conducted to determine the source of hydrogen needed to convert phenyl and phenoxy to benzene and phenol. Specifically, EUV exposure of Ph3Sb(O2CCD3)2 creates d0-benzene and d1-phenol with >95% isotopic purity. Several mechanistic pathways are proposed and discussed.
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 30 (1), 121-131, 2017
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679300891136
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- NII Article ID
- 130005950305
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- NII Book ID
- AA11576862
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 028336519
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed