Influence of Sensitizer on Two-photon Initiated Polymerization (TPIP) in Photoresist SU-8

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  • Kondo Naoko
    Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology
  • Watanabe Toshiyuki
    Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology
  • Totani Kenro
    Division of Applied Chemistry, Graduate School of Engineering, Tokyo University of Agriculture and Technology

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Influence of photosensitizer on two-photon initiated polymerization (TPIP) of epoxide resin have been investigated. The three-dimensional (3D) micro-structures were fabricated to estimate rate of cationic polymerization by using TPIP. The line width and thickness of 3D micro-structures were measured as a function of laser-pulse energy, irradiation wavelength, and scanning speed to elucidate the rate of polymerization (Rp). It was demonstrated that volume of 3D micro-structures depends on the square of input intensity and proportional to two-photon absorption cross section and irradiation time of laser. Rp strongly depends on the quantum yield of H+ rather than efficiency of electron transfer from photosensitizer to initiator. Experimental results were compared with an original mathematical model.

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