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- Akira Kawai
- Nagaoka University of Technology
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- Takayoshi Niiyama
- Nagaoka University of Technology
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- Masahito Hirano
- Nagaoka University of Technology
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- Makoto Sakata
- Nagaoka University of Technology
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- Atsushi ishikawa
- Nagaoka University of Technology
書誌事項
- タイトル別名
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- Photopolymer Science and Technology Award
この論文をさがす
抄録
The Photopolymer Science and Technology Award No.052100, the Best Paper Award 2005, was presented to Akira Kawai, Takayoshi Niiyama, Masahito Hirano, Makoto Sakata and Atsushi Ishikawa, all from Nagaoka University of Technology, for their outstanding contribution published in Journal of Photopolymer Science and Technology 17(3), 441-448 (2004), entitled "Cohesion Property of Resist Pattern Surface Analyzed by Tip Indentation Method", ibid., 17(3), 453-456 (2004), entitled "Interaction Force Analysis of Resist Film Surface in Water Vapor", ibid., 17(3), 457-460 (2004), entitled "Meniscus Analysis in Micro Gap During Liquid Drying Process", and ibid., 17(3), 461-464 (2004), entitled "Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement".
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 18 (1), 5-8, 2005
フォトポリマー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679301169536
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- NII論文ID
- 130004464422
- 40006743849
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2MXmtVCntLk%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 7337835
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
