Suppression of Pattern Edge Roughness by Low Ion Strength Developer.
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- Kumada Teruhiko
- Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)
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- Sumitani Hiroaki
- Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)
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- Matsui Yasuji
- Super-fine SR lithography Laboratory, Association of Super-advanced Electronics Technologies (ABET)
Search this article
Journal
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 14 (4), 519-522, 2001
The Society of Photopolymer Science and Technology(SPST)
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Details 詳細情報について
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- CRID
- 1390282679301437824
-
- NII Article ID
- 130003406675
- 40005352074
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- NII Book ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD3MXmt1Wntr8%3D
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- ISSN
- 13496336
- 09149244
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- NDL BIB ID
- 5833449
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- Text Lang
- en
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- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
