Synthesis, Characterization and Lithography Performance of Novel Anionic Photoacid Generator (PAG) Bound Polymers

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  • Wang Mingxing
    Polymer Nanotechnology Laboratory at Center for Optoelectronics and Optical Communications & Department of Chemistry, University of North Carolina
  • Tang Mingzhen
    Department of Physics and Optical Science, University of North Carolina
  • Her Tsing-Hua
    Department of Physics and Optical Science, University of North Carolina
  • Yueh Wang
    Intel Corp
  • Gonzalves Kenneth E.
    Polymer Nanotechnology Laboratory at Center for Optoelectronics and Optical Communications & Department of Chemistry, University of North Carolina

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Abstract

Two new monomeric anionic PAGs, and their corresponding polymers, were prepared and characterized. The acid generating efficiency of PAG bound polymers is in the order: NO2 PAG ≈ F4 PAG > CF3 PAG, which agrees well with the electron withdrawing power of the substituents. The NO2 PAG bound polymer showed better imaging resolution, than the CF3 PAG bound polymer. Based on the acid generating efficiency, and our previous results on F4 PAG bound polymer for EUV photoresists, these two new PAGs and PAG bound polymers have the potential for imaging via EUV lithography.

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