Synthesis, Characterization and Lithography Performance of Novel Anionic Photoacid Generator (PAG) Bound Polymers
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- Wang Mingxing
- Polymer Nanotechnology Laboratory at Center for Optoelectronics and Optical Communications & Department of Chemistry, University of North Carolina
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- Tang Mingzhen
- Department of Physics and Optical Science, University of North Carolina
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- Her Tsing-Hua
- Department of Physics and Optical Science, University of North Carolina
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- Yueh Wang
- Intel Corp
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- Gonzalves Kenneth E.
- Polymer Nanotechnology Laboratory at Center for Optoelectronics and Optical Communications & Department of Chemistry, University of North Carolina
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説明
Two new monomeric anionic PAGs, and their corresponding polymers, were prepared and characterized. The acid generating efficiency of PAG bound polymers is in the order: NO2 PAG ≈ F4 PAG > CF3 PAG, which agrees well with the electron withdrawing power of the substituents. The NO2 PAG bound polymer showed better imaging resolution, than the CF3 PAG bound polymer. Based on the acid generating efficiency, and our previous results on F4 PAG bound polymer for EUV photoresists, these two new PAGs and PAG bound polymers have the potential for imaging via EUV lithography.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (6), 793-797, 2007
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詳細情報 詳細情報について
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- CRID
- 1390282679301972224
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- NII論文ID
- 130004833190
- 40015763851
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD1cXisVersw%3D%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 9307210
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可