EUV Research Activity at SEMATECH

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Abstract

EUV lithography is needed by the semiconductor industry for both its resolution and for the process simplification it provides compared to multiple patterning. However it needs many innovations to make it a success and is an expensive technology to develop. Major areas of concern are source power, defect free mask availability, defect freedom during use and resist performance. Long term it will also need improved mask and material technology for higher NA EUV imaging. SEMATECH is working on mask technology, defects and resist technology for EUV imaging and has developed new mask inspection technology, novel approaches to EUV resist, lower defectivity mask blanks and improved cleaning methods. SEMATECH’s work enables the semiconductor industry to share the cost of developing EUV technology and accelerates the progress of EUV.

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