Resist Surface Roughness Calculated using Theoretical Percolation Model.

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  • Resist Surface Roughness Calculated Usi

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One of the most probable causes for the surface roughness on resist patterns is the locally ununiform distribution of photochemical events. This ununiformity arises because the photochemical events occur with a probability density as a function of illumination. This inevitable roughness is estimated by applying the percolation theory in the evaluation of the cross-linking reactions in negative resists. The calculation demonstrates that nanometer-scale roughness is formed at the surface of resist, and is larger in a chemically amplified resist than that in a conventional resist. The surface morphology of chemically amplified resists exposed to X-rays is also experimentally evaluated using atomic force microscopy.

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