Effect of H<SUB>2</SUB>0 Plasma Treatment on the Adhesion of Metal Thin Filmst

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  • NAKAMAE Katsuhiko
    Department of Industrial Chemistry, Faculty of Engineering, Kobe University
  • YAMAGUCHI Katsuya
    Department of Industrial Chemistry, Faculty of Engineering, Kobe University
  • TANIGAWA Satoshi
    Department of Industrial Chemistry, Faculty of Engineering, Kobe University
  • SUMIYA Kenji
    Department of Industrial Chemistry, Faculty of Engineering, Kobe University
  • MATSUMOTO Tsunetaka
    Department of Industrial Chemistry, Faculty of Engineering, Kobe University

Bibliographic Information

Other Title
  • 水蒸気プラズマによるポリ(エチレンテレフタレート)フィルムの表面処理と蒸着コバルト薄膜の接着性
  • スイジョウキ プラズマ ニ ヨル ポリ エチレンテレフタレート フィルム ノ
  • Thin films-preparation, structure and properties. Effect of H2O plasma treatment on the adhesion of metal thin films.

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Abstract

Poly(ethylene terephthalate) (PET) films were treated by H2O plasma. The wettability of the PET film surface and its adhesivity to Co deposited thin films were investigated. The wettability of PET films was improved by H2O plasma treatment, and the surface modified PET film adhered strongly to Co deposited thin films. For lower radio frequency (RF) power (25 W) during H2O plasma treatment, the wettability of PET films was slowly improved with an increase in the treatment time, and the adhesivity to Co deposited thin films was improved remarkably at a shorter treatment time. For Higher RF power (100 W)the wettability of PET film was immediately improved, and the adhesion to Co deposited thin films was improved abruptly with treatment time. PET film showed specific magnetic characterizations.

Journal

  • NIPPON KAGAKU KAISHI

    NIPPON KAGAKU KAISHI 1987 (11), 1995-2000, 1987-11-10

    The Chemical Society of Japan

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