書誌事項
- タイトル別名
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- Spray coating of photoresist for three dimensional micromachining
- リッタイテキ マイクロマシニング ノ タメ ノ レジストスプレーコーティング
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抄録
New technique using spray coating of photoresist is developed for realizing the photolithography on samples having deep three dimensional structures. This technique is compatible with the highly developed planar photolithography and therefore promising for realizing the wide variety of micro-electro mechanical systems. The photoresist is sprayed as minute particles and carried to the sample surface. The particle dries individually without suffering the problem due to the resist flow or the surface tension (e.g., disconnection of film or accumulation of resist at corners). The appropriate drying condition realizes the thin and uniform resist film. The effects of some parameters which have the significant influence to the spray coating condition are examined. The thin and uniform photoresist film is reproducibly obtained on the deep three dimensional structure. The patterning is demonstrated using the conventional exposing equipment not only at the planar area but also corners or slant surfaces.
収録刊行物
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- 電気学会論文誌Ｅ（センサ・マイクロマシン部門誌）
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電気学会論文誌Ｅ（センサ・マイクロマシン部門誌） 122 (5), 235-243, 2002
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679438115456
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- NII論文ID
- 10008218870
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- NII書誌ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
- http://id.crossref.org/issn/13418939
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- NDL書誌ID
- 6152580
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
