Specific SOI Wafer with Embedded Pattern of Silicon Dioxide and its Application for 2-dimensional Wide Angle Optical Scanner
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- Katashiro Masahiro
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
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- Arima Michitsugu
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
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- Tokuda Kazunari
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
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- Okamura Toshiro
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
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- Matsumoto Kazuya
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
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- Miyajima Hiroshi
- Corporate R&D Center, OLYMPUS OPTICAL CO., LTD.
Bibliographic Information
- Other Title
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- パターン付き埋め込み酸化膜をもつ特殊SOIウエハーの製作プロセスとその広角2次元光スキャナヘの適用
- パターン付き埋め込み酸化膜をもつ特殊SOIウエハーの製作プロセスとその広角2次元光スキャナへの適用
- パターン ツキ ウメ コミ サンカ マク オ モツ トクシュ SOI ウエハー ノ セイサク プロセス ト ソノ コウカク 2ジゲン ヒカリ スキャナ エ ノ テキヨウ
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Abstract
In this paper, we present a fabrication technique that enables integration of polyimide into MEMS devices with multi-thickness layer structures. The technique is mainly to utilize a specific SOI (silicon on insulator) wafer with embedded pattern of silicon dioxide. An SOI wafer with a 10 micron thick device layer is thermally oxidized to 400 nm thick and patterned. The patterned side is bonded with another conventional silicon wafer. And then the handle layer of the SOI is removed by wet etching. Although the embedded pattern has 400 nm step structure, no pattern deformation takes place. By using this type of SOI wafers, we have developed a 2-dimensional optical scanner. The MEMS mirror has simultaneously achieved a high resonant frequency and a wide scan angle with no failure. Polyimide-based hinges and thin moving inertia, 10 micron thickness, lead to these characteristics.
Journal
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- IEEJ Transactions on Sensors and Micromachines
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IEEJ Transactions on Sensors and Micromachines 123 (5), 152-157, 2003
The Institute of Electrical Engineers of Japan
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Details 詳細情報について
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- CRID
- 1390282679438413824
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- NII Article ID
- 130000083502
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- NII Book ID
- AN1052634X
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- ISSN
- 13475525
- 13418939
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- NDL BIB ID
- 6571330
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed