CVD Material Processing. A Role of O Radical on the Formation of O2 Gas Plasma.

DOI Web Site Web Site 1 Citations 35 References
  • MATSUI ISAO
    Mechanical Systems Laboratory, TOSHIBA Research & Development Center

Bibliographic Information

Other Title
  • ＣＶＤ材料プロセス　　Ｏ２プラズマにおけるＯラジカルの役割
  • O2 プラズマ ニ オケル Oラジカル ノ ヤクワリ

Search this article

Description

The effect of plasma formed gas on the plasma structure is investigated using a self consistent continuous fluid plasma model, which assumes that the local field approximation was attained in the RF plasma. The swarm parameter was obtained by Boltzmann analysis for O2 gas which contains various amounts of O radicals. Positive ion density, negative ion density, and electron density in the O2 RF plasma including O radical generation were calculated by self-consistent one dimensional continuous fluid plasma model. The calculation results show the dominant positive charged particle became O+ from O2+ with increasing amount of O radical in O2. The plasma positive densities are not greatly affected if O radical content did not exceed 1% of O2. It was concluded that O2 plasma structure can be evaluated by source gas plasma calculation neglecting radical formation, since O radical formation in the O2 plasma is estimated as less than 0.2% of O2.

Journal

Citations (1)*help

See more

References(35)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top