Coercivity Enhancement by Roughening a Substrate Surface

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  • Birukawa Masahiro
    Information Storage Materials Laboratory, Toyota Technological Institute
  • Miyatake Norio
    Optical Disk Systems Development Center, Matsushita Electric Industrial Co., Ltd.
  • Suzuki Takao
    Information Storage Materials Laboratory, Toyota Technological Institute

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Other Title
  • 基板の粗面化処理による磁壁抗磁力の制御
  • キバン ノ ソメンカ ショリ ニ ヨル ジヘキ コウジリョク ノ セイギョ

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Description

The present study describes a wall pinning coercivity enhancement due to roughening a substrate surface by plasma etching using CF_4 gas. Although a roughness amplitude R_a is only 0.62 nm, the coercivity enhancement more than 2 kOe is achieved by adjusting a plasma etching condition, because roughness wavelength is comparable to domain wall width. These results are expected for a prevention technique of domain shrinkage due to thermal energy in high-density magneto-optical recording.

Journal

  • ITE Technical Report

    ITE Technical Report 24.22 (0), 1-6, 2000

    The Institute of Image Information and Television Engineers

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