書誌事項
- タイトル別名
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- Development of a Plasma Spectroscopic Instrument by an Image Processing Method and Verifications
- ガゾウ ショリホウ ニ ヨル プラズマ ハッコウ ブンコウ ソウチ ノ カイハツ ト ケンショウ
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Plasma measuring methods have been developed to measure the properties of plasmas which cannot be touched directly. For instance, Quadropole Mass Spectroscopy (QMS) was developed to survey what kinds of compound are included in the plasma directly. We have measured by using Plasma Emission Spectroscopy method. It has been considered to be one of the effective method because of not affecting the plasma. We have developed a new type of plasma spectroscopic device by an image processing method. On this paper, we'd like to report advantages and differences between the new device and the old one.
収録刊行物
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- 電気学会論文誌Ｃ（電子・情報・システム部門誌）
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電気学会論文誌Ｃ（電子・情報・システム部門誌） 135 (1), 111-116, 2015
一般社団法人 電気学会
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詳細情報 詳細情報について
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- CRID
- 1390282679583668992
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- NII論文ID
- 130004870119
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- NII書誌ID
- AN10065950
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- ISSN
- 13488155
- 03854221
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- NDL書誌ID
- 026043520
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
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