Visualization of Scattering Mist by Si Wafer Substrates Spin Cleaning

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  • A104 基板スピン洗浄における飛散ミストの可視化
  • キバン スピン センジョウ ニ オケル ヒサン ミスト ノ カシカ

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Abstract

The scattering mist single plate spin cleaning process used in the manufacture of semi-conductors and liquid crystal displays, causes a rebound into the substrate during the spin cleaning process, resulting in re-pollution. It is therefore extremely important for scattering mist control to improve cleaning performance in the development of the single plate spin cleaner. The behaviour from substrate to scattering mist during the spin process is made visible with the laser light sheet method. This simplifies investigations into the form of the device and cleaning process conditions. The scattering mist within the spin cup for all cleaning processing conditions is visible with the use of a compact Laser particles visualization system. By comparing the visible pixels and the particles adhering to substrate surfaces, the authors examined the visibility technology application in the development of a single plate spin cleaner.

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