書誌事項
- タイトル別名
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- In situ Measurement Technologies in Semiconductor Manufacturing.
抄録
In situ measurements in semiconductor manufacturing with lasers are advantageous in that they cause very little disturbance to objects and allow real-time accurate quantification. This paper reviews three in situ measuring methods for gas concentration, particle identification, and wafer temperature based on IR absorption, laser induced breakdown (LIB) and laser ultrasound generation in solids, respectively.
収録刊行物
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- レーザー研究
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レーザー研究 27 (10), 676-681, 1999
一般社団法人 レーザー学会
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詳細情報 詳細情報について
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- CRID
- 1390282679622690048
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- NII論文ID
- 130003702604
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- ISSN
- 13496603
- 03870200
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可