A Study on EEM(Elastic Emission Machining) - Influences of Dissolved Oxygen to Si Wafer Surface.
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- YAMAUCHI Kazuto
- 正会員 大阪大学大学院工学研究科
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- KATAOKA Toshihiko
- 正会員 大阪大学大学院工学研究科
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- ENDO Katsuyoshi
- 正会員 大阪大学大学院工学研究科
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- INAGAKI Kouji
- 正会員 大阪大学大学院工学研究科
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- SUGIYAMA Kazuhisa
- 正会員 大阪大学大学院工学研究科
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- MAKINO Syuji
- 大阪大学大学院 (現, シャープ (株))
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- MORI Yuzo
- 正会員 大阪大学大学院工学研究科
Bibliographic Information
- Other Title
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- EEM(Elastic Emission Machining)に関する研究 加工液中の溶存酸素がSiウエハ表面に与える影響
- EEM Elastic Emission Machining ニカンスルケンキ
- Influences of Dissolved Oxygen to Si Wafer Surface
- 加工液中の溶存酸素がSiウエハ表面に与える影響
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Abstract
Dissolved oxygen in the ultrapure water has been known to oxidize Si wafer. In EEM, ultrapure water is also employed as a carrier fluid of ultra-fine powders. Oxidization properties of Si (100) wafer surface under EEM setup were investigated in this work. An oxidization with the growth speed higher than several 10nm/h was observed. The distribution of the oxide film thickness seems to depend strongly on the flow pattern on the Si wafer surface. The high speed oxidization observed in this work was understood to concern both to the extent of shear flow rate on the Si wafer surface and to contents of not only dissolved oxygen but also OH- ion in the ultrapure water.
Journal
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- Journal of the Japan Society for Precision Engineering
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Journal of the Japan Society for Precision Engineering 64 (6), 907-912, 1998
The Japan Society for Precision Engineering
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Keywords
Details 詳細情報について
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- CRID
- 1390282679742759424
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- NII Article ID
- 110001367961
- 10006240459
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- NII Book ID
- AN1003250X
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- ISSN
- 1882675X
- 09120289
- http://id.crossref.org/issn/09120289
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- NDL BIB ID
- 4491909
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed