Nanoprocessing on Silicon (100) Surface by Using SPM and the Study of the Structural Change

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  • SPMを用いたSi単結晶のナノ加工と表面の構造変化
  • SPM オ モチイタ Si タンケッショウ ノ ナノ カコウ ト ヒョウメン ノ コウゾウ ヘンカ

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The fabricating methods of nanoscale shapes on Si (100) surface by using atomic force microscope (AFM) and scanning tunneling microscope (STM) were investigated. As a result, nanoscale grooves and faces were fabricated by the scratching methods using AFM. The scratching loads had a major influence on these shapes. Nanoscale pits, grooves and faces were fabricated by STM as a result of controlling the sample bias voltage and the tip curvature radius of tungsten probes. Cross-sectional TEM observations of the nanoscale grooves and faces fabricated by AFM and STM were carried out to study the microstructural changes of Si single crystals. As a result of the TEM observations, it was found that many dislocations and an amorphous phase appeared in the surface of the grooves and faces fabricated by AFM. On the other hand, the single crystalline structure without a dislocation was preserved in the surface of the grooves and faces fabricated by STM. Based on these results, it is considered that the fabricating mechanisms of AFM and STM are a mechanical processing and an electric field evaporation, respectively.

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