書誌事項
- タイトル別名
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- Development of Nanometer-level Accurate Replication Process Using Electroforming
- Development of Nanometer-level Accurate Replication Process Using Electroforming -Optimization of Room Temperature Nickel Electrodeposition Conditions and Precise Figure Replication of Mandrel
- —Optimization of Room Temperature Nickel Electrodeposition Conditions and Precise Figure Replication of Mandrel—
- —常温ニッケル電析条件の検討とマンドレルの高精度転写—
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説明
Electroforming is a major replication method for producing precise and complicated shapes. In industry, precise optical components and molds are produced by the electroforming process for a long time. Recently, this method has also been used in MEMS fields for mass production of the nanometer pattern. In this study, we focus on the electrodeposition condition to increase the replication accuracy. In order to remove the influence of thermal deformation from the replication accuracy, Ni electrodeposition under a room temperature condition is employed. The electrodeposition condition is optimized from the viewpoint of the internal stress. Then we developed the electrodeposition system which can remove the babble on an electrodeposited film perfectly by vacuum degassing. The results of the replication experiment of a mandrel indicate that the proposed condition will open new applications and devises in electroforming.
収録刊行物
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- 精密工学会誌
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精密工学会誌 80 (6), 582-586, 2014
公益社団法人 精密工学会
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詳細情報 詳細情報について
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- CRID
- 1390282679807064960
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- NII論文ID
- 130004745481
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- ISSN
- 1882675X
- 09120289
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可