書誌事項
- タイトル別名
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- Development of Low Damage Sputter-Deposition Method for the Preparation of Organic Light Emitting Diode
- ユウキ EL ソシ サクセイ ノ タメ ノ テイダメージスパッタ タイセキホウ ノ カイハツ
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Deposition of top Al electrode films by a low damage Facing-Target sputtering method (FTS) have been attempted to fabricate an Organic Light Emitting Diode (OLED) (glass substrate/ITO /NPB/Alq3/BCP/LiF/Al). Suppression of the high energy secondary electron incidence to the substrate during the sputter-deposition of the aluminum electrode films was effective to reduce the light emitting voltage and improve the luminance efficiency of the OLED. In addition, optimization of sputtering gas pressure and reduction of the sputtering current was necessary in the deposition the electrode films to obtain the OLED with good performance. Compared with the OLED fabricated by vacuum evaporation, the OLED fabricated by our low damage sputtering system at the optimum conditions showed better injection current-luminance efficiency, although it had a little bit larger operating voltage.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 59 (3), 59-64, 2016
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282680270570880
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- NII論文ID
- 130005142437
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- NII書誌ID
- AA12298652
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 027188845
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可