Evaluation of Thin Films Prepared by r.f. Sputtering with a Poly(etheretherketone) Target

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  • UCHIDA Daiu
    Graduate School of Natural Science and Technology, Kanazawa University
  • HASEGAWA Nobuhiko
    Graduate School of Natural Science and Technology, Kanazawa University
  • SOFUE Hidesato
    Faculty of Engineering, Kanazawa University
  • IWAMORI Satoru
    Graduate School of Natural Science and Technology, Kanazawa University Faculty of Engineering, Kanazawa University Department of Mechanical Engineering, School of Engineering, Tokai University
  • SAITO Yoji
    Faculty of Science and Technology, Seikei University

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Other Title
  • Poly(etheretherketone) (PEEK) をターゲットとした高周波スパッタリング法による薄膜作製とその評価
  • Poly etheretherketone PEEK オ ターゲット ト シタ コウシュウハ スパッタリングホウ ニ ヨル ハクマク サクセイ ト ソノ ヒョウカ

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Thin films were sputtered by an r.f. sputtering with a poly(etheretherketone) (PEEK) target at four different sputtering conditions e.g., 150 Watt (W)-0.6 Pascal (Pa), 25 W-0.6 Pa, 150 W-3.0 Pa and 25 W-3.0 Pa. Visible light transmissions of these sputtered thin films were measured with spectrophotometer. Elemental compositions and chemical bonding states of these sputtered thin films were analyzed with x-rays photoelectron spectroscopy (XPS) and fourier transform infrared spectroscopy (FT-IR). Surface morphologies of these sputtered thin films were observed with atomic force microscope (AFM). Molecular structures and elemental compositions of these sputtered thin films prepared with the r.f. sputtering were quite different from pristine PEEK. Oxygen contents of these thin films decreased compared to that of the pristine PEEK. Pressures during the sputtering give large effects on the molecular structure, elemental compositions and surface morphologies of these thin films.<br>

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