書誌事項
- タイトル別名
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- Dependence on Substrate Temperature of the Properties of Co Thin Films Fabricated by RF Magnetron Sputtering with Multipolar Magnetic Plasma Confinement
- タジュウ ジキョクガタ コウシュウハ マグネトロン スパッタホウ ニ ヨル Co ハクマク ノ キバン オンド イソンセイ
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The dependence on substrate temperature of the structural properties of Co thin films deposited on silicon substrates by RF magnetron sputtering with multipolar magnetic plasma confinement (MMPC) was investigated. The structure of the Co films was characterized by X-ray diffraction (XRD), and their surface morphology by atomic force microscopy (AFM). It was found that the surface morphology depended strongly on the substrate temperature. The surface of Co thin films deposited at 400°C exhibited round connected textures with a maximum Rq (root mean square roughness) of 5.48 nm, while the films deposited at room temperature exhibited salient connected textures with an Rq of less than 1.18 nm. Furthermore, the XRD spectrum intensity observed for the Co films deposited at 400°C was higher than that of the films deposited at room temperature.<br>
収録刊行物
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- Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ
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Ｊｏｕｒｎａｌ ｏｆ ｔｈｅ Ｖａｃｕｕｍ Ｓｏｃｉｅｔｙ ｏｆ Ｊａｐａｎ 51 (6), 405-407, 2008
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282680272628352
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- NII論文ID
- 10021157758
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- NII書誌ID
- AA12298652
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 9571246
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可