Fabrication Method for Nanocluster Superatoms with High-Power Impulse Magnetron Sputtering

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  • TSUNOYAMA Hironori
    Faculty of Science and Technology, Keio University Nakajima Designer Nanocluster Assembly Project, ERATO, Japan Science and Technology Agency
  • TONA Masahide
    Ayabo Corporation
  • TSUKAMOTO Keizo
    Ayabo Corporation
  • NAKAJIMA Atsushi
    Faculty of Science and Technology, Keio University Nakajima Designer Nanocluster Assembly Project, ERATO, Japan Science and Technology Agency Keio Institute of Pure and Applied Science (KiPAS), Keio University

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  • 大電力パルスマグネトロンスパッタを用いたナノクラスター超原子の生成技術
  • ダイ デンリョク パルスマグネトロンスパッタ オ モチイタ ナノクラスター チョウゲンシ ノ セイセイ ギジュツ

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　Intensive ion source for single-size nanoclusters was developed on the basis of high-power impulse magnetron sputtering (HiPIMS) technique combined with a low-pressure, low-temperature gas flow reactor. The nanocluster source exhibits superior characteristics originating from pulsed, high-power sputtering compared to conventional direct-current sputtering; (1) enhanced ion intensities, (2) fascicle tuning of nanocluster sizes, and (3) enhanced selectivity of stable, magic nanoclusters. The metallic (silver, platinum, and palladium) and binary (transition-metal and silicon) nanocluster ions in the size range of several to one hundred atoms can be generated with ion current of 100 pA to 10 nA (108 to 1011 nanoclusters/sec). The growth mechanism of nanoclusters in the source was also explained by the nucleation theory.<br>

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