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Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar<sup>+</sup> Ion Beam
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- YOSHIMURA Satoru
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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- IKUSE Kazumasa
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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- SUGIMOTO Satoshi
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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- MURAI Kensuke
- National Institute of Advanced Industrial Science and Technology (AIST)
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- KIUCHI Masato
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University National Institute of Advanced Industrial Science and Technology (AIST)
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- HAMAGUCHI Satoshi
- Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
Bibliographic Information
- Other Title
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- ポリメタクリル酸メチル樹脂の水素プラズマ曝露と低エネルギーアルゴンイオンビームによるエッチング
- ポリメタクリルサン メチル ジュシ ノ スイソ プラズマ バクロ ト テイエネルギーアルゴンイオンビーム ニ ヨル エッチング
- Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar+ Ion Beam
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Description
Effects of hydrogen plasma exposure in polymer dry etching processes have been investigated with a low-energy mass-selected ion beam system. In the present study, we use a spin-coated polymethylmethacrylate (PMMA) film on a quartz crystal microbalance as a model polymer. The surface modification of the PMMA film by the hydrogen plasma exposure in an inverter plasma system was investigated by X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. XPS results show that oxygen atoms were preferentially sputtered from the PMMA film by the hydrogen plasma exposure. Spectroscopic ellipsometry results show that depth of the modified layer of the hydrogen plasma exposed PMMA film was about 40 nm. Etching yields of the pristine PMMA film and the hydrogen plasma exposed PMMA film by 470 eV Ar+ ion beam injections were measured. It is found that the etching yield of the hydrogen plasma exposed PMMA film was about half of that of the pristine PMMA film.<br>
Journal
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- Journal of the Vacuum Society of Japan
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Journal of the Vacuum Society of Japan 56 (4), 129-132, 2013
The Vacuum Society of Japan
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Details 詳細情報について
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- CRID
- 1390282680272825728
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- NII Article ID
- 10031163964
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- NII Book ID
- AN00119871
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- BIBCODE
- 2013JVSJ...56..129Y
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- COI
- 1:CAS:528:DC%2BC3sXhtVKjt77E
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- ISSN
- 18824749
- 18822398
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- NDL BIB ID
- 024633811
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- Text Lang
- ja
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- Article Type
- journal article
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
- KAKEN
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- Abstract License Flag
- Disallowed