書誌事項
- タイトル別名
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- Evaluation of Gold Film Deposited using Neutral Argon Beam
- チュウセイ アルゴンビーム オ モチイテ サクセイ シタ キン ハクマク ノ ヒョウカ
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抄録
Gold film of a thickness of about 100 nm with extremely high resistivity was obtained through sputtering by neutral argon beam. The resistivity differed according to the angle of incidence for argon beam, indicating the lowest value in the vicinity of 60 degree. In the case of sputtering for the angle of incidence of 60 degree, the work function for gold film indicated the lowest value and the secondary electron emission current from gold target during the sputtering increased markedly. These results have suggested that the ionized gold particles play an important role at growth process, leading to enhanced the decrease of amorphous structure into the gold film.<br>
収録刊行物
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- Journal of the Vacuum Society of Japan
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Journal of the Vacuum Society of Japan 56 (5), 182-186, 2013
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390282680272904704
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- NII論文ID
- 10031169381
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- NII書誌ID
- AA12298652
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- BIBCODE
- 2013JVSJ...56..182H
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- COI
- 1:CAS:528:DC%2BC3sXps1Cqs7c%3D
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- ISSN
- 18824749
- 18822398
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- NDL書誌ID
- 024669560
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
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- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可