Fabrication of ultraprecisely figured mirrors for hard X-ray focusing and evaluation of focusing property

DOI

Bibliographic Information

Other Title
  • 超高精度X線集光ミラーの作製と集光特性の評価

Description

Recently, at third-generation synchrotron radiation facilities, by utilizing modern X-ray microscopy with highly brilliant and coherent X-rays, detailed investigations regarding molecular structures, chemical bonding conditions, etc. have been carried out as objects of various interesting samples including biological and medical ones. Nano-focused X-ray beams are necessary to add nanometer-level spatial analytical ability to the microscopy. X-ray focusing at Kirkpatric-Baez setup with two total reflection mirrors is a promising method from the viewpoints of high efficient and energy tunable focusing. Here we report development of ultraprecise mirror optics and realization of a nano-focused hard X-ray beam. Fabricated mirrors having 0.1 nm (RMS) level accuracy in both figure and surface roughness led to ideal diffraction limited focusing at hard X-ray regions. Focal size defined as full width at half maximum in intensity profiles were 36nm × 48nm at an X-ray energy of 15keV.

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Keywords

Details 詳細情報について

  • CRID
    1390282680630190848
  • NII Article ID
    130004657900
  • DOI
    10.11522/pscjspe.2005s.0.788.0
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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