Fabrication of multi-tier molds using a gray-scale laser beam lithography and dry etching

DOI
  • Sung-Won Youn
    National Institute of Advanced Industrial Science and Technology
  • Sang-Cheon Park
    National Institute of Advanced Industrial Science and Technology
  • Qing Wang
    National Institute of Advanced Industrial Science and Technology
  • Suzuki Kenta
    National Institute of Advanced Industrial Science and Technology
  • Hiroshima Hiroshi
    National Institute of Advanced Industrial Science and Technology

Bibliographic Information

Other Title
  • グレースケールレーザビームリソグラフィとドライエッチング法を併用したインプリント工程用多段型の製作

Description

Grayscale laser beam lithography (G-LBL) is a low-cost and simple process for creating multi-tier and undulated surfaces by modulating the exposure dose during writing. In this study, a G-LBL technique was studied to be applied to fabricate multi-tier Si and quartz molds and a grey scale optical element. Based on the investigated relation among the relative laser exposure dose, the thicknesses and interference colours of residual resist layers, a structure for a grey scale optical element was fabricated in the resist on Si substrate. Additionally, multi-tier Si and quartz molds were fabricated by G-LBL followed by reactive ion etching (RIE). Finally, fabricated mold samples were used for UV imprint experiments to evaluate their feasibility as molds.

Journal

Keywords

Details 詳細情報について

  • CRID
    1390282680630740864
  • NII Article ID
    130005030849
  • DOI
    10.11522/pscjspe.2011s.0.771.0
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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