Evaluation of friction-coefficient of silicon carbon nitride films by HWCVD method

DOI

Bibliographic Information

Other Title
  • ＨＷＣＶＤ法によるシリコン炭窒化膜の摩擦係数評価

Description

We have studied the silicon carbon nitride (SiCN) film by hot-wire CVD (HWCVD) method which is possible to deposit films with low temperature in large area.This report describes the characteristics of SiCN films, such as peel-strength, hardness, and a coefficient of friction, for the purpose of utilizing a SiCN film in the machining field.

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Keywords

Details 詳細情報について

  • CRID
    1390282680633125760
  • NII Article ID
    130004660665
  • DOI
    10.11522/pscjspe.2012a.0.313.0
  • Text Lang
    ja
  • Data Source
    • JaLC
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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