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Environment controlled Raman spectroscopy of graphene on SiO2/Si substrate
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- Koyama Tomohiro
- Faculty of Science, Tokyo University of Science
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- Inaba Takumi
- Faculty of Science, Tokyo University of Science
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- Komatsu Katsuyoshi
- Institute of Innovative Research, Tokyo Institute of Technology National Institute for Materials Science
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- Moriyama Satoshi
- National Institute for Materials Science
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- Shimizu Maki
- Faculty of Science, Tokyo University of Science
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- Homma Yoshikazu
- Faculty of Science, Tokyo University of Science
Bibliographic Information
- Other Title
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- SiO2/Si基板上グラフェンの環境制御ラマン分光測定
Description
酸素プラズマアッシャー処理を施したSiO2/Si基板上に機械的剥離法によってグラフェンを作製し，環境制御チャンバ内においてラマン分光法で評価した．アニール処理によってG・2Dバンドそれぞれのダウンシフト，水蒸気雰囲気中におけるそれぞれのアップシフトを観測した．プラズマ処理によってSiO2表面にシラノール基が形成され，これと水素結合した水分子の流入出による効果を表していると考える．
Journal
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- Abstract of annual meeting of the Surface Science of Japan
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Abstract of annual meeting of the Surface Science of Japan 36 (0), 440-, 2016
The Japan Society of Vacuum and Surface Science
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Details 詳細情報について
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- CRID
- 1390282680656515968
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- NII Article ID
- 130005175924
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- Text Lang
- ja
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- Data Source
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- JaLC
- CiNii Articles
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- Abstract License Flag
- Disallowed