Island Electromigration on Isotropic and Anisotropic Surface: Si(111), Si(001)(<Special Issue>Recent Trend of Crystal Growth Theory)
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- Metois Jean-Jaques
- Centre de Recherche sur les Mecanismes de la Croissance Cristalline, CNRS
Bibliographic Information
- Other Title
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- 解説 Island Electromigration on Isotropic and Anisotropic Surfaces: Si(111),Si(001)
- カイセツ Island Electromigration on Isotropic and Anisotropic Surfaces Si 111 Si 001
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Abstract
We have used electron microscopy to study the drift velocity of micrometer-size monolayer-thick silicon islands on Si (001) and Si (111) under near equilibrium conditions and direct current (DC) heating. At temperatures between 1000℃ and 1100℃, the island on Si (001) perform a gliding motion at constant velocity (at a given T) in or against the current direction depending on the island reconstruction. The Stoyanov' model can explain very well this island motion. Concerning the Si (111), our results obtained at around 1200℃ show that the islands move in the opposite direction of DC , this is a qualitative prove of the existence of an Ehrlich-Schoebel effect on Si(111). The model of O. Pierre-Louis and T.L. Einstein can be used to explain this mobility.
Journal
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- Journal of the Japanese Association for Crystal Growth
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Journal of the Japanese Association for Crystal Growth 29 (1), 12-16, 2002
The Japanese Association for Crystal Growth
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Details 詳細情報について
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- CRID
- 1390282680873432192
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- NII Article ID
- 110002715515
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- NII Book ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- NDL BIB ID
- 6135072
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed