Epitaxial Growth of Organic Thin Films on Alkali Halide Substrates(<Special Issue>Organic Crystals)
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- Yoshimoto Noriyuki
- Graduate School of Frontier Materials and Functional Engineering, Iwate University
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- Omote Kazuhiko
- X-Ray Research Laboratory, Rigaku Corporation
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- Saito Yoshio
- Kyoto Institute of Technology
Bibliographic Information
- Other Title
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- アルカリハライド基板上での有機薄膜のエピタキシー(<小特集>有機結晶の新展開)
- アルカリハライド基板上での有機薄膜のエピタキシー
- アルカリハライド キバン ジョウ デ ノ ユウキ ハクマク ノ エピタキシー
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Abstract
Vapor deposited organic thin films are constructed with aggregates of islands on alkali halide substrate. Generally, each island orients in the plane with specific epitaxial relationships. Furthermore, it is well known that orientation and polymorphism depend on the growth condition of thin films. We have so far investigated the epitaxy and polymorphism in vapor deposited organic thin films by X-ray diffractmetry. In this article, a large variety of epitaxial thin films of organic compounds on alkali halide substrates are reported and the mechanisms are discussed.
Journal
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- Journal of the Japanese Association for Crystal Growth
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Journal of the Japanese Association for Crystal Growth 32 (5), 358-364, 2005
The Japanese Association for Crystal Growth
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Details 詳細情報について
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- CRID
- 1390282680874113664
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- NII Article ID
- 110007327720
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- NII Book ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- NDL BIB ID
- 7784724
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- Text Lang
- ja
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- Data Source
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- JaLC
- IRDB
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed