Growth of Large GaN Single Crystals with Low Dislocation Density Using the Liquid Phase Epitaxy Technique(<Special Issue>Bulk Crystals for Substrates)
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- Kawamura Fumio
- Graduate school of Electrical Engineering, Osaka University
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- Kawahara Minoru
- Graduate school of Electrical Engineering, Osaka University
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- Morishita Masanori
- Graduate school of Electrical Engineering, Osaka University
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- Umeda Hidekazu
- Graduate school of Electrical Engineering, Osaka University
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- Yamada Yuji
- Graduate school of Electrical Engineering, Osaka University
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- Gejo Ryohei
- Graduate school of Electrical Engineering, Osaka University
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- Yoshimura Masashi
- Graduate school of Electrical Engineering, Osaka University
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- Mori Yusuke
- Graduate school of Electrical Engineering, Osaka University
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- Sasaki Takatomo
- Graduate school of Electrical Engineering, Osaka University
Bibliographic Information
- Other Title
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- LPE成長法による大型・低転位GaN単結晶の育成(<小特集>基板結晶)
- LPE成長法による大型・低転位GaN単結晶の育成
- LPE セイチョウホウ ニ ヨル オオガタ テイテンイ GaNタンケッショウ ノ イクセイ
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Abstract
The growth of large size GaN single crystals with low dislocation density was succeeded by applying the Liquid Phase Epitaxy (LPE) technique and some improvements for the Na flux methods. We examined the conditions at which GaN are grown in the Na flux and found that Na promotes the solubility of nitrogen against the Ga-Na melt due to strong power to reduce the nitrogen states. We review our attempts for the growth of large GaN single crystals and understanding growth mechanism in the alkali-based flux system.
Journal
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- Journal of the Japanese Association for Crystal Growth
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Journal of the Japanese Association for Crystal Growth 32 (1), 3-9, 2005
The Japanese Association for Crystal Growth
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Details 詳細情報について
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- CRID
- 1390282680874995840
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- NII Article ID
- 110007327670
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- NII Book ID
- AN00188386
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- ISSN
- 21878366
- 03856275
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- NDL BIB ID
- 7311819
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- CiNii Articles
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- Abstract License Flag
- Disallowed