OS4-1-7 高表面電荷密度の狭ピッチ櫛歯状エレクトレットフィルムの作製 : 電荷注入済みCYTOPフィルムへのエキシマ・レーザビーム照射による静電反発現象の回避(OS4 電池レス・デバイスのためのエネルギーハーベストの展開)

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  • OS4-1-7 Fabrication of Narrow Comb-shaped Electret with High Surface Potential : Avoidance of Electrostatic Repulsion by Removing Charge from Charge-implanted CYTOP Film Using Excimer Laser Beam

説明

A new fabrication method of narrow comb-shaped electret using excimer laser abrasion is proposed in this paper. In this method, charge is firstly implanted into the whole area of unpatterned electret film; then the charge in unwanted area is removed by thermal energy of excimer laser irradiation. The electrostatic repulsion problem, which limits the minimum width of electret, is cleared by this method. The surface potential was linearly decreased with increasing excimer laser energy. The electret width is defined by interval of laser line scan. In this study, minimum electret width of 20 μm was successfully achieved.

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