T0302-1-2 ボッシュプロセスで作製されたMEMS構造体の強度設計法に関する基礎的研究([T0302-1]高信頼マイクロ・ナノデバイスのための設計・計測技術(1):シリコンの破壊と疲労)

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  • T0302-1-2 Basic research for a strength design scheme of MEMS structures fabricated by Bosch process

説明

Concerning the strength design scheme of MEMS structures patterned by Bosch process, proposed in the previous study, its application range was statistically estimated. The cumulative fracture probability F of structures with arbitrary stress distributions was calculated so as to give the predicted strengths with the cumulative fracture probability F=0.623. The scale parameter of Weibull distribution fit to the corresponding experimental data was obtained by maximum likelihood method. By comparing these results, the trend in prediction error with respect to the shape of structures was systematically discussed.

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