Measurements of Diffusion Coefficient of CF<sub>2</sub> Radical in DC Pulsed CF<sub>4</sub>/O<sub>2</sub> Discharge Plasma

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  • Arai Toshihiko
    Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology, 1030 Shimo–Ogino, Atsugi 243–02
  • Goto Miki
    Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology, 1030 Shimo–Ogino, Atsugi 243–02
  • Takayama Daisuke
    Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology, 1030 Shimo–Ogino, Atsugi 243–02
  • Shimizu Tetsuya
    Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology, 1030 Shimo–Ogino, Atsugi 243–02
  • Murakami Masahiko
    Department of Electronic and Electrical Engineering, Kanagawa Institute of Technology, 1030 Shimo–Ogino, Atsugi 243–02

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  • Measurements of Diffusion Coefflcient of CF2 Radical in DC Pulsed CF4/O2 Discharge Plasma.

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説明

Laser-induced fluorescence has been used to measure the CF2 radical ground-state densities after extinction of DC pulsed CF4/O2 discharge plasma. From the measurement, the CF2 radical was shown to be removed mainly by a diffusion process. Its diffusion coefficients are found to be D=150 cm2· Torr· s-1 in O2 and D=65 cm2· Torr· s-1 in CF4 at room temperature.

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